Electron Beam Lithography System

This call for tender is for the purchase of an electron beam lithography system for the nanofabrication of devices, chips, structures and patterns required for research purposes. The system must be able to expose electron-sensitive resists in specific CAD designed patterns. We require a turn-key solution including all required hardware, software and peripheral devices necessary for system operation. For a more detailled overview of our required specifications we refer you to the Performance Specifications document.